<i>In situ</i> detection of RF breakdown on microfabricated surface ion traps

Microfabricated surface ion traps are a principle component of many ion-based quantum information science platforms. The operational parameters these devices pushed to the edge their physical capabilities as experiments strive for increasing performance. When applied radio-frequency (RF) voltage is increased too much, can experience damaging electric discharge events known RF breakdown. We introduce two novel techniques in situ detection breakdown, which we implemented while characterizing breakdown threshold produced at Sandia National Laboratories. In traps, did not always occur immediately after voltage, but often minutes or even hours later. This result surprising context suggested mechanisms vacuum. Additionally, extent visible damage caused by with voltage. To minimize probability when power first device, our results strongly suggest that should be ramped up over course several and monitored forbreakdown.